Large negative photoresistivity in amorphous NdNiO₃ film
Stupakov, Alexandr; Kocourek, Tomas; Nepomniashchaia, Natalia; Tyunina, Marina; Dejneka, Alexandr (2021-11-19)
Stupakov, A.; Kocourek, T.; Nepomniashchaia, N.; Tyunina, M.; Dejneka, A. Large Negative Photoresistivity in Amorphous NdNiO₃ Film. Coatings 2021, 11, 1411. https://doi.org/10.3390/coatings11111411
© 2021 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
https://creativecommons.org/licenses/by/4.0/
https://urn.fi/URN:NBN:fi-fe2022020918390
Tiivistelmä
Abstract
A significant decrease in resistivity by 55% under blue lighting with ~0.4 J·mm⁻² energy density is demonstrated in amorphous film of metal-insulator NdNiO₃ at room temperature. This large negative photoresistivity contrasts with a small positive photoresistivity of 8% in epitaxial NdNiO₃ film under the same illumination conditions. The magnitude of the photoresistivity rises with the increasing power density or decreasing wavelength of light. By combining the analysis of the observed photoresistive effect with optical absorption and the resistivity of the films as a function of temperature, it is shown that photo-stimulated heating determines the photoresistivity in both types of films. Because amorphous films can be easily grown on a wide range of substrates, the demonstrated large photo(thermo)resistivity in such films is attractive for potential applications, e.g., thermal photodetectors and thermistors.
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